Name: Residual Gas Analyzer – Transpector CPX – 100 AMU
Availability: InStock

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Use Cases

300 mm Wafer Degas

Advanced Processes including Atomic Layer Deposition (ALD)

Etch Processes including metal, dielectric, silicon etch, and high-density plasma etch

Chemical Vapor Deposition (CVD) Processes including high-k dielectrics, HDP-CVD, LP-CVD, SA-CVD, CVD low-k, PE-CVD

Diffusion and Epitaxy Processes

Ion Implantation

Typically used in hydrogen and related industrial applications

Capabilities

Advanced Systems with industry-leading pumping system and advanced temperature control

Smaller Fab Footprint with 30% reduction in system volume

Optional Dual Filament Ion Source for extended lifetime and improved tool uptime

Configurable HexBlock with up to three pressure inlets for specific pressure ranges

Corrosion Resistant Capacitance Diaphragm Gauge (CDG) for monitoring process pressure and protecting the system

Automated Calibration for long-term data stability and accuracy

Process Integration with FabGuard® software and INFICON world-class applications experts

Fast Data Collection with short RF settling times up to 1.8 milliseconds per data point

Innovative Electron Multiplier for decreased maintenance downtime and increased tool uptime

Turbomolecular Pump for best fit and function with fast pumping and reduced footprint

Maximum Uptime with robust, field replaceable ion sources and inlet options

Field-Proven Inlet System with adaptable sampling for up to three different process pressures

Residual Gas Analyzer – Transpector CPX – 100 AMU

Use Cases

Capabilities

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